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28 Серпня 2025
Нові генератори сигналів Siglent - SDG3000X
25 Липня 2025
Нові камери Kurokesu на базі IMX462
Глосарій
MBE (molecular beam epitaxy)
MCA (multichannel analyzer)
MEMS (micro-electro-mechanical systems)
Microfocus X-ray source
Minimum sensitivity, Maximum sensitivity
MOCVD (metal organic chemical vapor deposition)
MOEMS (micro-opto-electro-mechanical systems)
Modulation transfer function (MTF) - CCD
MOST (Media Oriented Systems Transport)
MPP (multi-pinned phase) operation
Multimode fiber
Mu metal
MCA (multichannel analyzer)
MEMS (micro-electro-mechanical systems)
Microfocus X-ray source
Minimum sensitivity, Maximum sensitivity
MOCVD (metal organic chemical vapor deposition)
MOEMS (micro-opto-electro-mechanical systems)
Modulation transfer function (MTF) - CCD
MOST (Media Oriented Systems Transport)
MPP (multi-pinned phase) operation
Multimode fiber
Mu metal
MBE (molecular beam epitaxy)
MBE (molecular beam epitaxy) / Молекулярно-променева епітаксія
An epitaxial growth technology for forming a thin-film crystal on a heated substrate crystal by supplying molecular beams of crystal-constituent elements, which are created by evaporating each element from separate cells in an ultra-high vacuum.
MBE (molecular beam epitaxy) / Молекулярно-променева епітаксія
An epitaxial growth technology for forming a thin-film crystal on a heated substrate crystal by supplying molecular beams of crystal-constituent elements, which are created by evaporating each element from separate cells in an ultra-high vacuum.
MCA (multichannel analyzer)
MCA (multichannel analyzer) / Багатоканальний аналізатор
An instrument that displays the heights of multiple input pulses as a histogram.
MCA (multichannel analyzer) / Багатоканальний аналізатор
An instrument that displays the heights of multiple input pulses as a histogram.
MEMS (micro-electro-mechanical systems)
MEMS (micro-electro-mechanical systems) /
Мікроелектромеханічні системи
A compact three-dimensional system processed using micro-machining technology. The basic process technology is the semiconductor lithography for integrating electronic circuits but also includes silicon deep reactive ion etching, sacrificial etching, bonding, and other technologies for fabricating rugged shapes and hollow structures. Representative devices include microactuators and microsensors. Some devices integrate electronic circuits such as CMOS.
A compact three-dimensional system processed using micro-machining technology. The basic process technology is the semiconductor lithography for integrating electronic circuits but also includes silicon deep reactive ion etching, sacrificial etching, bonding, and other technologies for fabricating rugged shapes and hollow structures. Representative devices include microactuators and microsensors. Some devices integrate electronic circuits such as CMOS.
Microfocus X-ray source
Microfocus X-ray source / Мікрофокусне джерело рентгенівського випромінювання
This is an X-ray source with a very small focal spot on the order of micrometers. Microfocus X-ray sources allow capturing clear, sharp magnified X-ray images since edge blur is suppressed even when magnified.
Microfocus X-ray source / Мікрофокусне джерело рентгенівського випромінювання
This is an X-ray source with a very small focal spot on the order of micrometers. Microfocus X-ray sources allow capturing clear, sharp magnified X-ray images since edge blur is suppressed even when magnified.
Minimum sensitivity, Maximum sensitivity
Minimum sensitivity, Maximum sensitivity / Мінімальна чутливість, Максимальна чутливість
The minimum and maximum light input powers required to ac- quire bit error rates within a certain level. The values differ depending on the transmission bit rate, the required bit error rate, the type of pseudo-random codes used for measurement, the extinction ratio, and so forth. The maximum sensitivity is also called overload.
Minimum sensitivity, Maximum sensitivity / Мінімальна чутливість, Максимальна чутливість
The minimum and maximum light input powers required to ac- quire bit error rates within a certain level. The values differ depending on the transmission bit rate, the required bit error rate, the type of pseudo-random codes used for measurement, the extinction ratio, and so forth. The maximum sensitivity is also called overload.
MOCVD (metal organic chemical vapor deposition)
MOCVD (metal organic chemical vapor deposition) / Хімічне парофазне осадження металоорганічних сполук
An epitaxial growth technology for forming a thin-film crystal on a heated substrate crystal by thermally decomposing and chemically reacting an organic metal supplied in the form of vapor, which is solid or liquid at normal temperatures and pressures.
MOCVD (metal organic chemical vapor deposition) / Хімічне парофазне осадження металоорганічних сполук
An epitaxial growth technology for forming a thin-film crystal on a heated substrate crystal by thermally decomposing and chemically reacting an organic metal supplied in the form of vapor, which is solid or liquid at normal temperatures and pressures.
MOEMS (micro-opto-electro-mechanical systems)
MOEMS (micro-opto-electro-mechanical systems) / Мікрооптико-електромеханічні системи
Compact optics systems using MEMS technology. Also called optical MEMS. Applications include thermal type detectors that make use of hollow structures produced with MEMS technology and optical scanners and optical switches that control the direction of light travel using microactuators. They are also applied to wavelength variable filters and optical interferometers that take advantage of MEMS feature that enables precise position control.
MOEMS (micro-opto-electro-mechanical systems) / Мікрооптико-електромеханічні системи
Compact optics systems using MEMS technology. Also called optical MEMS. Applications include thermal type detectors that make use of hollow structures produced with MEMS technology and optical scanners and optical switches that control the direction of light travel using microactuators. They are also applied to wavelength variable filters and optical interferometers that take advantage of MEMS feature that enables precise position control.
Modulation transfer function (MTF) - CCD
Modulation transfer function (MTF) - CCD / Модуляційна передаточна характеристика - ПЗЗ
The modulation transfer function (MTF) is commonly used to quantify the resolution of an image sensor that reproduces the contrast at a certain spatial frequency of the scene. Since the photosensitive area of a CCD consists of discrete pixels, it exhibits a limiting resolution determined by the Nyquist limit based on the discrete sampling theorem. For example, when a black-and-white pattern is viewed with a CCD, the difference between the black and white signal levels decreases as the pattern becomes finer, finally reaching the point at which the pattern cannot be resolved. The ideal MTF is expressed as follows:

where f and fn are the spatial frequency and spatial Nyquist frequency of the scene, respectively.
However, because of the difficulty of creating an optical sine wave, a test pattern that provides a square wave is generally used. In this case, the spatial frequency response is called the contrast transfer function (CTF) to distinguish it from the MTF. (Note that the CTF can be converted into the MTF by means of a Fourier transform.)
Actual CCD resolution is determined by the extent of diffusion occurring before the signal charge collects inside the silicon. When the incident photons are absorbed within the depletion layer, the generated charge does not diffuse and is collected by the corresponding pixels. Consequently, the resolution does not deteriorate. In other words, the resolution depends on the depth in the silicon where the incident photons are absorbed. The longer the incident photon wavelength, the more the resolution deteriorates.
Modulation transfer function (MTF) - CCD / Модуляційна передаточна характеристика - ПЗЗ
The modulation transfer function (MTF) is commonly used to quantify the resolution of an image sensor that reproduces the contrast at a certain spatial frequency of the scene. Since the photosensitive area of a CCD consists of discrete pixels, it exhibits a limiting resolution determined by the Nyquist limit based on the discrete sampling theorem. For example, when a black-and-white pattern is viewed with a CCD, the difference between the black and white signal levels decreases as the pattern becomes finer, finally reaching the point at which the pattern cannot be resolved. The ideal MTF is expressed as follows:

where f and fn are the spatial frequency and spatial Nyquist frequency of the scene, respectively.
However, because of the difficulty of creating an optical sine wave, a test pattern that provides a square wave is generally used. In this case, the spatial frequency response is called the contrast transfer function (CTF) to distinguish it from the MTF. (Note that the CTF can be converted into the MTF by means of a Fourier transform.)
Actual CCD resolution is determined by the extent of diffusion occurring before the signal charge collects inside the silicon. When the incident photons are absorbed within the depletion layer, the generated charge does not diffuse and is collected by the corresponding pixels. Consequently, the resolution does not deteriorate. In other words, the resolution depends on the depth in the silicon where the incident photons are absorbed. The longer the incident photon wavelength, the more the resolution deteriorates.
MOST (Media Oriented Systems Transport)
MOST (Media Oriented Systems Transport) / Стандарт MOST
An in-vehicle network standard mainly used in European vehicles. This is a ring type network using POF (plastic optical fibers), and its internode communication speeds are 25 Mbps and 150 Mbps. Besides in-vehicle applications, MOST is used for interphone networks in airports and the like.
MOST (Media Oriented Systems Transport) / Стандарт MOST
An in-vehicle network standard mainly used in European vehicles. This is a ring type network using POF (plastic optical fibers), and its internode communication speeds are 25 Mbps and 150 Mbps. Besides in-vehicle applications, MOST is used for interphone networks in airports and the like.
MPP (multi-pinned phase) operation
MPP (multi-pinned phase) operation / Режим MPP
MPP is an operation mode in which all CCD channels under the MOS structure gates constituting the CCD electrodes are reversed. This mode is also called reverse operation and reduces the dark current because it drastically suppresses the generation of thermally excited electrons at the silicon-silicon dioxide interface.
MPP (multi-pinned phase) operation / Режим MPP
MPP is an operation mode in which all CCD channels under the MOS structure gates constituting the CCD electrodes are reversed. This mode is also called reverse operation and reduces the dark current because it drastically suppresses the generation of thermally excited electrons at the silicon-silicon dioxide interface.
Multimode fiber
Multimode fiber / Багатомодове волокно
An optical fiber for transmitting light in multiple transverse mode (electromagnetic field distribution). Multimode fibers are not suitable for long-distance transmissions because the trans- mitted waveform is distorted due to differences in the signal light arrival time depending on the mode (modal dispersion). Compared to single-mode fibers, the core diameter is large so that connecting to a light emitter is easy. However, condensing a light beam onto a light receiver element for high-speed communication is difficult because the element must have a small photosensitive area.
Multimode fiber / Багатомодове волокно
An optical fiber for transmitting light in multiple transverse mode (electromagnetic field distribution). Multimode fibers are not suitable for long-distance transmissions because the trans- mitted waveform is distorted due to differences in the signal light arrival time depending on the mode (modal dispersion). Compared to single-mode fibers, the core diameter is large so that connecting to a light emitter is easy. However, condensing a light beam onto a light receiver element for high-speed communication is difficult because the element must have a small photosensitive area.
Mu metal
Mu metal / Мю-метал
A shield made up of high permittivity metal. It is used to shield a photomultiplier from magnetic fields.
Mu metal / Мю-метал
A shield made up of high permittivity metal. It is used to shield a photomultiplier from magnetic fields.
























































